Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System

CPV codes

Description

University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, such as biomedicine, sensor technology, and optics. For more information, please contact the contracting unit to organize a dialogue by 10.8.2026 at the address: hankinnat@oulu.fi. Please note that contracting authority is on summer holiday during 11.7.-2.8.2026.

Source

View the official notice on TED ↗