Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool - PR1184925-3460-W
TED · 330929-2026cn-standardNo deadline given
Buyer
NameFraunhofer-Gesellschaft, Einkauf B12
CountryDE
Published2026-05-15
Deadline—
Value
Estimated—
Awarded—
CPV codes
31712100 Electrical machinery & lightingDescription
PR1184925-3460-W Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool
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|---|---|---|---|
| 2026-05-19 | Fully Automated Wafer Photoresist Strip & Metal Etch Wet Tool - PR1184925-3460-W | Fraunhofer-Gesellschaft, Einkauf B12 DE | 100% |
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| 2026-05-13 | Fully Automated Wafer Cleaning Tool (IZM-130) - PR1097493-3460-P | — DE | 89% |
| 2026-06-10 | HF-Gas Phase Etching Tool - PR1209440-2480-W | Fraunhofer-Gesellschaft, Einkauf B12 DE | 88% |
| 2026-05-13 | HF-Gas Phase Etching Tool - PR1209440-2480-W | Fraunhofer-Gesellschaft, Einkauf B12 DE | 88% |
Records136,978 tendersNewest notice2026-06-24Last ingest2026-06-25 · TED daily 06:00Parser health (7d)all runs clean