European Tender Electron Beam Lithography system
Buyer
NameUniversiteit Twente
CountryNL
Published2026-06-15
Deadline2026-08-14
Value
Estimated€3,500,000 · 3,500,000 EUR
Awarded—
CPV codes
38000000 Laboratory, optical & precision equipment38341100 Laboratory, optical & precision equipmentDescription
The University of Twente is tendering to purchase an Electron Beam Lithography system. The MESA+ Institute of the University of Twente will invest in a new Electron Beam system (e-beam system). A system, suitable for defining patterns in electron sensitive resists, at high resolution and high speed, compatible with a wide range of applications and substrate types up to 200mm in diameter. The system will be used by a wide range of users, i.e. academic researchers and students as well as industrial engineers with different backgrounds (photonics, (nano)-electronics etc.) and different levels of expertise.
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