Ultra-high Resolution Electron-beam Lithography System
TED · 679334-2026Contract noticeCloses in 39 days · 2026-11-10
Buyer
NameETH Zürich - Abt. Procurement & Export Services
CountryCH
Published2026-10-02
Deadline2026-11-10
Value
Estimated—
Awarded—
CPV codes
38000000 Laboratory, optical & precision equipmentDescription
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.